In 2019,Applied Physics Express included an article by Ikenoue, Takumi; Kawai, Toshikazu; Wakashima, Ryo; Miyake, Masao; Hirato, Tetsuji. SDS of cas: 13395-16-9. The article was titled 《Hole mobility improvement in Cu2O thin films prepared by the mist CVD method》. The information in the text is summarized as follows:
A high-mobility Cu2O thin film was fabricated using the mist chem. vapor deposition (CVD) method. This was achieved by suppressing the contamination from nitrogen impurities and optimum growth conditions to obtain single-phase Cu2O without CuO. A 600 nm Cu2O thin film was obtained using EDTA as a complexing agent in dry-air growth atm. for 120 min. The resulting thin film had a resistivity of 2.8 × 102 Ω ·cm, carrier concentration of 1.2 × 1015 cm-3 and hole mobility of 19.3 cm2·V-1·s-1. This hole mobility improved by two or more orders of magnitude compared to that of previous Cu2O thin film obtained by the mist CVD method. In the experiment, the researchers used many compounds, for example, Bis(acetylacetone)copper(cas: 13395-16-9SDS of cas: 13395-16-9)
Bis(acetylacetone)copper(cas: 13395-16-9) is used as PVC stabilizer, and curing agents for epoxy resins, acrylic adhesives and silicone rubbers. It is also used as solvents, lubricant additives, paint drier, and pesticides.SDS of cas: 13395-16-9
Referemce:
Copper catalysis in organic synthesis – NCBI,
Special Issue “Fundamentals and Applications of Copper-Based Catalysts”