Singh, Vivek published the artcilePrecursor to Gas Sensor: A Detailed Study of the Suitability of Copper Complexes as an MOCVD Precursor and their Application in Gas Sensing, Related Products of copper-catalyst, the publication is Inorganic Chemistry (2021), 60(22), 17141-17150, database is CAplus and MEDLINE.
There are very few p-type semiconductors available compared to n-type semiconductors for pos. sensing response for oxidizing gases and other important electronic applications. Cupric oxide (CuO) is one of the few oxides that show p-type conductivity, useful for sensing oxidizing gases. Many researchers obtained CuO using the chem. and solid-state routes, but uniformity and large-area deposition have been the main issues. Chem. vapor deposition is one such technique that provides control on several deposition parameters, which allow obtaining thin films having crystallinity and uniformity over a large area for the desired application. However, CuO-chem. vapor deposition (CVD) is still unfathomed due to the lack of suitability of copper precursors based on vapor pressure, contamination, and toxicity. Here, to address these issues, we have taken four Cu complexes (copper(II) acetylacetonate, copper(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionato), copper(II) ethylacetoacetate, and copper(II) tert-butylacetoacetate), which are evaluated using thermogravimetry for suitability as a CVD precursor. The decomposition behavior of the complexes was also exptl. confirmed by depositing CuO thin films via CVD. Phase purity, decomposition, volatility, growth rate, and morphol. characteristics of the films are investigated in detail. Anal. suggests that copper(II) tert-butylacetoacetate has the highest vapor pressure and growth rate at a low temperature, making it the most suitable precursor for high-throughput CVD. Further, to investigate the role of these precursors, films deposited using Cu complexes were subjected to gas sensing. The CuO gas sensor fabricated on glass shows pronounced NO2 sensing. The sensing results of CuO films have been explained from the standpoint of roughness, morphol., and unpassivated bonds present on the surface of films and vapor pressure of precursors. The higher d. of surface state and the lower resistivity of the Cu(tbaoac)2 film lead to a sensor with higher responsivity and sensitivity (down to 1 ppm). These precursors can probably be utilized to improve the performance of other metal oxide gas sensors, especially Cu2O and Cu-III-O2.
Inorganic Chemistry published new progress about 14284-06-1. 14284-06-1 belongs to copper-catalyst, auxiliary class Copper, name is Copper(II) ethylacetoacetate, and the molecular formula is C24H29N5O3, Related Products of copper-catalyst.
Referemce:
https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4660968/,
Special Issue “Fundamentals and Applications of Copper-Based Catalysts”