《Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates》 was written by Yamaguchi, Tomohiro; Nagai, Hiroki; Kiguchi, Takanori; Wakabayashi, Nao; Igawa, Takuto; Hitora, Toshimi; Onuma, Takeyoshi; Honda, Tohru; Sato, Mitsunobu. Name: Bis(acetylacetone)copper And the article was included in Applied Physics Express in 2020. The article conveys some information:
Epitaxial growth of Cu3N films on (0001)α-Al2O3 substrates was performed by mist chem. vapor deposition. As a source solution, 0.10 mol l-1 of copper (II) acetylacetonate dissolved in 28% aqueous ammonia was used. Even though an aqueous solution was used as the source solution, the epitaxial Cu3N film was realized without the incorporation of CuO and Cu2O phases in the growth of 300°C. The film was also found to have limited O incorporation from the results of scanning transmission electron microscopy and Rutherford back-scattering spectroscopy. The optical property of the Cu3N film was also investigated. The experimental process involved the reaction of Bis(acetylacetone)copper(cas: 13395-16-9Name: Bis(acetylacetone)copper)
Bis(acetylacetone)copper(cas: 13395-16-9) is used as PVC stabilizer, and curing agents for epoxy resins, acrylic adhesives and silicone rubbers. It is also used as solvents, lubricant additives, paint drier, and pesticides.Name: Bis(acetylacetone)copper
Referemce:
Copper catalysis in organic synthesis – NCBI,
Special Issue “Fundamentals and Applications of Copper-Based Catalysts”